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Sub-100 nm Channel Length Organic Field Effect Transistor Fabricated by Wafer-Scale Nanoimprint Lithography

Sub-100 nm Channel Length Organic Field Effect Transistor Fabricated by Wafer-Scale Nanoimprint Lithography

von Lichao Teng
Softcover - 9783944331492
34,99 €
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Beschreibung

This thesis was performed between October 2010 and October 2013 at the Institute of Semiconductors and Microsystems (IHM) of the Technische Universität Dresden (TU Dresden). The main task of this work was fabrication of short channel Organic Field Effect Transistors (OFET) using Nanoimprint Lithography (NIL). Both the UV based NIL and the thermal based NIL with wafer-scale polymer templates were applied to define OFET channel with lengths down to sub-100 nm range. A new technique termed NIL assisted Inkjet Printing (IJP) was developed that successfully achieved submicron range resolution. Fabricated devices were comprehensively characterized including DC and AC performances.

Details

Verlag TUDpress Verlag der Wissenschaften GmbH
Ersterscheinung 05. Februar 2014
Maße 21 cm x 14.8 cm x 1.1 cm
Gewicht 253 Gramm
Format Softcover
ISBN-13 9783944331492
Seiten 168

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