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Beschreibung
The book covers the fundamentals and advanced techniques of radiofrequency sputtering, including process optimization, troubleshooting, and sustainability practices. It provides a comprehensive overview of the technique, its applications in various industries, and practical guidance for researchers and engineers. It focuses on established and emerging applications and thus is a must-have reference for researchers in academia and developers in industry.
Thin-Film Deposition and Device Applications
Details
| Verlag | Wiley-VCH |
| Ersterscheinung | 07. Oktober 2026 |
| Maße | 24.4 cm x 17 cm |
| Format | Hardcover |
| ISBN-13 | 9783527356225 |
| Auflage | 1. Auflage |
| Seiten | 432 |
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