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Beschreibung
A graduate-level description of recent Japanese research on the chemistry of amorphous silicon film deposition associated with plasma CVD, a step in producing amorphous semiconductors. Reports on studies (of microscopic processes of gas-phase reaction as well as chemical reactions on the film growin
Details
| Verlag | Springer Netherland |
| Ersterscheinung | November 1989 |
| Maße | 23.4 cm x 15.6 cm |
| Gewicht | 606 Gramm |
| Format | Hardcover |
| ISBN-13 | 9780792303091 |
| Auflage | 1990 |
| Seiten | 277 |
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