Thin carbon containing films

The composite materials highly enriched with carbon species attract rapidly growing attention motivated by a wide spectrum of their potential applications. This book describes the detailed investigations concerning processing and stability of thin films including carbon species and their possible application as materials of a low dielectric constant (low-k). In order to gather a complex information regarding the chemical, morphological and dielectric properties of the produced layers a combination of the spectroscopy: X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure spectroscopy (NEXAFS) and Fourier transform infrared spectroscopy (FTIR), microscopy: atomic force microscopy (AFM) and electrical characterization: capacitance-voltage technique (CV) have been applied.