{"product_id":"lithography-free-nanopatterning-of-ps-b-pdms-block-copolymer-prospects-and-challenges-von-dipu-borah","title":"Lithography Free Nanopatterning of PS-b-PDMS Block Copolymer","description":"\u003cp\u003eSemiconductor device performance has been subject to continuing improvements over the years, largely due to a reduction of device dimensions as a consequence of improving resolution limits of ¿top-down¿ lithographic processes used in device fabrication. However, further progress is critically related to several issues including source design, material interactions and thermal management. ¿Bottom-up¿ approaches, based on hierarchical self-assembly of block copolymer (BCP) are the subject of intense research at present. It is highly challenging to achieve long-range translational order and robustness of systems fabricated with ¿bottom-up¿ approaches. The polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) BCP system has particular relevance because of its high Flory-Huggins parameter. However, the two major issues viz., strong surface dewetting and poor control over domain orientation arise in the PS-b-PDMS system. This book discusses various alternative chemical surface engineering approaches besides polymer brushes for PS-b-PDMS BCP self-assembly and subsequent effects on developing lithographic nanopatterns.\u003c\/p\u003e\u003cdiv class=\"aw-variant-hidden-subtitle-div\" id=\"aw-variant-subtitle-9783639766370\"\u003e\u003ch3\u003eProspects and Challenges\u003c\/h3\u003e\u003c\/div\u003e","brand":"Libri","offers":[{"title":"Softcover - 9783639766370","offer_id":39428382064733,"sku":"9783639766370","price":79.9,"currency_code":"EUR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0940\/0622\/files\/98906445-643a-40d9-b219-d93d1985998b.jpg?v=1768890359","url":"https:\/\/shop.autorenwelt.de\/products\/lithography-free-nanopatterning-of-ps-b-pdms-block-copolymer-prospects-and-challenges-von-dipu-borah","provider":"Autorenwelt Shop","version":"1.0","type":"link"}