{"product_id":"thin-films-of-multiferroic-bicoo3-von-knut-bjarne-gandrud","title":"Thin Films of Multiferroic BiCoO3","description":"\u003cp\u003eThe goal of this work was to deposit thin films of  bismuth cobalt oxide, which is a rather unexplored  yet promising multiferroic material, by Atomic Layer  Deposition(ALD). However, in order to achieve this  goal, first a suitable precursor combination for  deposition of bismuth oxide by ALD had to be found. This work presents the first reported thin film  deposition of ¿-Bi2O3 by ALD. In addition, thin  films of Co3O4 and CoO are for the first time  reported deposited by ALD from the respective novel  precursor combinations Co(thd)3\/O3 and Co(thd)2\/H2O  (thd = 2,2,6,6-tetramethyl-3,5-heptanedionate). Finally, BiPh3 (Ph = phenyl), Bi(t-OBu)3 (t-OBu =  tert-butoxide) and Bi(thd)3 were all investigated  for potential use as bismuth precursors in the ALD  process. Thin films of Co3O4 deposited from the  novel precursor combination Co(thd)3\/O3 was  investigated and a comparison to the already well  investigated precursor combination Co(thd)2\/O3 is  given. Deposition and investigation of thin films in  the Bi-Co-O system are also presented. However, an  etching process was observed between the Bi(thd)3  precursors and the Co3O4 surface. A possible  mechanism is presented.\u003c\/p\u003e\u003cdiv class=\"aw-variant-hidden-subtitle-div\" id=\"aw-variant-subtitle-9783838326511\"\u003e\u003ch3\u003eby Atomic Layer Deposition\u003c\/h3\u003e\u003c\/div\u003e","brand":"Autorenwelt Shop","offers":[{"title":"Softcover - 9783838326511","offer_id":39469229801565,"sku":"9783838326511","price":59.0,"currency_code":"EUR","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0940\/0622\/files\/c8364787-18d2-4dca-b14f-ce97b7dae3bb.jpg?v=1757824975","url":"https:\/\/shop.autorenwelt.de\/en\/products\/thin-films-of-multiferroic-bicoo3-von-knut-bjarne-gandrud","provider":"Autorenwelt Shop","version":"1.0","type":"link"}